The term nanolithography is derived from the Greek words “nanos”, meaning Dwarf; “lithos”, meaning rock; and “grapho” meaning to write. Therefore the literal translation is "tiny writing on rocks".

Using electron beams to create the patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the extreme ultraviolet (EUV) light used in state-of-the-art ...

Nearly 30 years ago, optical lithography was supposed to hit the wall at the magical 1 micron barrier, prompting the need for a new patterning technology such as direct-write electron beam and X-ray ...

While 3D devices and technology such as through-silicon vias (TSVs) definitely complicate matters in the design, verification and manufacturing space, one might assume there would also be an impact on ...

Computational lithography uses various techniques of resolution enhancement technology (RET) to create more perfect images on the chip as the elements of the transistor get smaller and smaller. THIS ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm ...